6N Ultra-Yakakwirira-Kuchena Sulfur Distillation uye Kucheneswa Maitiro ane Detailed Parameters

Kugadzirwa kwe6N (≥99.9999% kuchena) ultra-high-purity sulfur inoda multi-stage distillation, deep adsorption, uye ultra-clean filtration kubvisa trace metal, organic tsvina, uye zvikamu. Pazasi pane maindasitiri-mwero maitiro ekubatanidza vacuum distillation, microwave-inobatsira kucheneswa, uye chaiyo mushure mekurapa tekinoroji.

I. Raw Material Pretreatment uye Kubvisa Kusachena

1. Raw Material Sarudzo uye Pretreatment

• ,Zvinodiwa: Yekutanga sarufa kuchena ≥99.9% (3N giredhi), yakazara simbi tsvina ≤500 ppm, organic kabhoni yemukati ≤0.1%.
• ,Microwave-Inobatsira Kunyungudika:
  Crude sulfur inogadziriswa mumicrowave reactor (2.45 GHz frequency, 10–15 kW simba) pa140–150°C. Microwave-induced dipole rotation inova nechokwadi chekunyunguduka nekukurumidza ichiora organic tsvina (semuenzaniso, tar makomisheni). Nguva yekunyunguduka: 30-45 maminitsi; microwave kupinda kudzika: 10-15 cm
• ,Deionized Water Washing:
  Sarufa yakanyungudutswa inosanganiswa nemvura yakasvibiswa (resistivity ≥18 MΩ · cm) pa 1: 0.3 mass ratio mune yakamutswa reactor (120 ° C, 2 bar pressure) kweawa imwe kubvisa munyu unonyungudika mumvura (semuenzaniso, ammonium sulfate, sodium chloride). The aqueous phase is decanted and used again for 2-3 cycles kusvika conductivity ≤5 μS/cm.

2. Multi-Stage Adsorption uye Filtration

• ,Diatomaceous Earth/Activated Carbon Adsorption:
  Diatomaceous Earth (0.5-1%) uye activated kabhoni (0.2-0.5%) inowedzerwa kune yakanyungudutswa sarufa pasi pe nitrogen kuchengetedzwa (130 ° C, 2-awa inomutsa) kushambadza simbi yakaoma uye yakasara organics.
• ,Ultra-Precision Sefa:
  Kusefa kwematanho maviri uchishandisa titanium sintered filters (0.1 μm pore size) pa ≤0.5 MPa system pressure. Post-filtration particulate count: ≤10 particles / L (saizi> 0.5 μm).

II. Multi-Stage Vacuum Distillation Maitiro

1. Primary Distillation (Metal Impurity Removal).

• ,Equipment: Yakakwirira-kuchena quartz distillation column ine 316L Stainless simbi yakarongeka yakarongedza (≥15 theoretical plates), vacuum ≤1 kPa.
• ,Operational Parameters:
• ,Feed Temperature: 250–280°C (sarufa inofashaira pa444.6°C pasi pekumanikidzwa kwe ambient; vacuum inoderedza kufashaira kusvika pa260–300°C).
• ,Reflux Ratio: 5:1–8:1; mbiru yepamusoro tembiricha kuchinja ≤±0.5°C.
• ,Product: Kuchena kwesarufa yakanyungudutswa ≥99.99% (giredhi re4N), tsvina yese yesimbi (Fe, Cu, Ni) ≤1 ppm.

2. Secondary Molecular Distillation (Organic Impurity Removal).

• ,Equipment: Short-path molecular distiller ine 10–20 mm evaporation-condensation gap, evaporation tembiricha 300–320°C, vacuum ≤0.1 Pa.
• ,Kuparadzana Kusina Kuchena:
  Low-boiling organics (semuenzaniso, thioethers, thiophene) inonyungudika uye inobviswa, nepo kusvibiswa kwepamusoro-kubikira (semuenzaniso, polyaromatics) kunoramba kuri mumasara nekuda kwekusiyana kwema molecular free path.
• ,Product: Sulfur kuchena ≥99.999% (5N giredhi), organic kabhoni ≤0.001%, residue mwero <0.3%.

3. Kukwenenzvera kwenzvimbo yepamusoro (Kuwana Kuchena kwe6N).

• ,Equipment: Horizontal zone refiner ine multi-zone tembiricha control (±0.1°C), zone yekufamba kumhanya 1–3 mm/h.
• ,Kusarurana:
  Kushandisa segregation coefficients (K=Csolid/CliquidK=Cyakasimba/Cliquid), 20-30 zone inopfuura concentrate simbi (As, Sb) kumagumo ingot. Iyo yekupedzisira 10-15% ye sulfur ingot inoraswa.

III. Post-Kurapwa uye Ultra-Yakachena Kugadzira

1. Ultra-Yakachena Solvent Extraction

• ,Ether/Carbon Tetrachloride Extraction:
  Sulfur inosanganiswa ne chromatographic-grade ether (1: 0.5 volume ratio) pasi pe ultrasonic rubatsiro (40 kHz, 40 ° C) kwemaminitsi makumi matatu kubvisa trace polar organics.
• ,Solvent Recovery:
  Molecular sieve adsorption uye vacuum distillation inoderedza masara esolvent kusvika ≤0.1 ppm.

2. Ultrafiltration uye Ion Exchange

• ,PTFE Membrane Ultrafiltration:
  Sarufa yakanyungudutswa inosefa kuburikidza ne0.02 μm PTFE membranes pa 160-180 ° C uye ≤0.2 MPa pressure.
• ,Ion Exchange Resins:
  Chelating resins (semuenzaniso, Amberlite IRC-748) bvisa ppb-level metal ions (Cu²⁺, Fe³⁺) pa1–2 BV/h kuyerera kwemazinga.

3. Ultra-Yakachena Nzvimbo Kugadzira

• ,Inert Gasi Atomization:
  Mukirasi yegumi yekuchenesa imba, sarufa yakanyungudutswa yakanyungudutswa ine nitrogen (0.8–1.2 MPa pressure) kuita 0.5–1 mm spherical granules (unyoro <0.001%).
• ,Vacuum Packaging:
  Chigadzirwa chekupedzisira ndeye vacuum-yakavharwa mualuminium composite firimu pasi pe Ultra-pure argon (≥99.9999% kuchena) kudzivirira oxidation.

IV. Key Process Parameters

V. Kudzora Hunhu uye Kuedzwa

1. ,Trace Impurity Analysis:

• ,GD-MS (Glow Discharge Mass Spectrometry): Inoona simbi pa ≤0.01 ppb.
• ,TOC Analyzer: Inoyera organic kabhoni ≤0.001 ppm.

1. ,Particle Saizi Kudzora:
   Laser diffraction (Mastersizer 3000) inovimbisa D50 kutsauka ≤± 0.05 mm.
2. ,Kuchena Kwepamusoro:
   XPS (X-ray Photoelectron Spectroscopy) inosimbisa pamusoro peokisidhi ukobvu ≤1 nm.

VI. Chengetedzo uye Magadzirirwo Ezvakatipoteredza

1. ,Kudzivirira Kuputika:
   Infrared flame detectors uye nitrogen mafashama masisitimu anochengetedza mazinga eokisijeni <3%
2. ,Emission Control:

• ,Acid magasi: Kukwesha kweNaOH kwematanho maviri (20% + 10%) kunobvisa ≥99.9% H₂S/SO₂.
• ,VOCs: Zeolite rotor + RTO (850°C) inoderedza asiri-methane hydrocarbons kusvika ≤10 mg/m³.

1. ,Waste Recycling:
   Kuderedza kupisa kwepamusoro (1200 ° C) kunodzorera simbi; zvakasara zvesarufa zvinyorwa <0.1%.

VII. Techno-Economic Metrics

• ,Kushandiswa Kwemagetsi: 800–1200 kWh magetsi uye matani 2–3 chiutsi patani ye6N salfur.
• ,Yield: Sulfur kupora ≥85%, residue rate <1.5%.
• ,Mutengo: Mutengo wekugadzira ~120,000–180,000 CNY/ton; mutengo wemusika 250,000–350,000 CNY/ton (semiconductor giredhi) .

Iyi nzira inogadzira 6N sarufa ye semiconductor photoresists, III-V kommoni substrates, uye mamwe maapplication epamberi. Chaiyo-nguva yekutarisa (semuenzaniso, LIBS yekutanga ongororo) uye ISO Kirasi 1 yekuchenesa mukamuri calibration inovimbisa kuenderana mhando.

Mashoko omuzasi

1. Reference 2: Industrial Sulfur Purification Standards
2. Reference 3: Yepamberi Filtration Techniques mu Chemical Engineering
3. Reference 6: High-Purity Materials Processing Handbook
4. Reference 8: Semiconductor-Giredhi Chemical Production Protocols
5. Reference 5: Vacuum Distillation Optimization